· The Rockwell
Solid State Electronics Laboratory (RSSEL) was established in 1977 with
assistance from Rockwell International, NASA and Cornell University. The Laboratory has been developed as a
vertically-integrated research facility, capable of producing high quality
III-V semiconducting materials, characterizing these materials and fabricating
devices. Faculty in
the Department of Electrical Engineering have maintained the educational
and research goals of the RSSEL.
· The Rockwell Solid State Electronics Laboratory will provide a
vertically-integrated laboratory environment for performing semiconductor
material and device research, primarily in the area of compound
semiconductors. The participants are
faculty and students (graduate and undergraduate) in the Department of
Electrical Engineering. These research
activities are correlated with the graduate academic program in the Department
of Electrical Engineering. Participation
by other engineering and science academic units is welcomed.
To provide a laboratory setting
for the processing of compound, alloy, and elemental semiconductor materials by
various epitaxial growth and deposition processes.
facilities for the characterization of semiconductor materials.
· To provide facilities for the fabrication of devices based upon semiconductor materials.
To maintain a funding base
through research grants and contracts to maintain the laboratory facilities,
and to provide for enhancement, replacement and improvement of the facilities.
a research environment for the interaction of faculty and students.
· To produce research results which may be presented to the technical/scientific community.
Fabrication Laboratory: The Microelectronics Fabrications Laboratory (MFL) has
been developed as an instructional laboratory for the presentation of silicon
device processing techniques in the courses ELEN 614 and ELEN 615. This facility was partially funded by the
Microelectronics Center of North Carolina (MCNC). The MFL equipment includes contact
photolithography, oxidation/diffusion furnaces, electron beam evaporation, and
materials and device characterization (ellipsometry,
current-voltage, capacitance-voltage, surface profiling, and optical
microscopy). The various instruments are
also utilized in research programs within the Department of Electrical
Engineering and the University. A remote
RF plasma chemical vapor deposition system for the deposition of amorphous
silicon compounds provides some research effort in this Laboratory. Faculty Contact: Dr.
Ward J. Collis
If you have any questions, contact Dr. Ward J. Collis