Rockwell Solid State Electronics Laboraties



The Rockwell Solid State Electronics Laboratory (RSSEL) was established in 1977 with assistance from Rockwell International, NASA and Cornell University. The Laboratory has been developed as a vertically-integrated research facility, capable of producing high quality III-V semiconducting materials, characterizing these materials and fabricating devices. Faculty in the Department of Electrical Engineering have maintained the educational and research goals of the RSSEL.



The Rockwell Solid State Electronics Laboratory will provide a vertically-integrated laboratory environment for performing semiconductor material and device research, primarily in the area of compound semiconductors. The participants are faculty and students (graduate and undergraduate) in the Department of Electrical Engineering. These research activities are correlated with the graduate academic program in the Department of Electrical Engineering. Participation by other engineering and science academic units is welcomed.



        To provide a laboratory setting for the processing of compound, alloy, and elemental semiconductor materials by various epitaxial growth and deposition processes.

        To provide facilities for the characterization of semiconductor materials.

        To provide facilities for the fabrication of devices based upon semiconductor materials.

        To maintain a funding base through research grants and contracts to maintain the laboratory facilities, and to provide for enhancement, replacement and improvement of the facilities.

        To provide a research environment for the interaction of faculty and students.

        To produce research results which may be presented to the technical/scientific community.


         Molecular Beam Epitaxy Laboratory: 


         Semiconductor Characterization Laboratory:


         Microelectronics Fabrication Laboratory:  The Microelectronics Fabrications Laboratory (MFL) has been developed as an instructional laboratory for the presentation of silicon device processing techniques in the courses ELEN 614 and ELEN 615. This facility was partially funded by the Microelectronics Center of North Carolina (MCNC). The MFL equipment includes contact photolithography, oxidation/diffusion furnaces, electron beam evaporation, and materials and device characterization (ellipsometry, current-voltage, capacitance-voltage, surface profiling, and optical microscopy). The various instruments are also utilized in research programs within the Department of Electrical Engineering and the University. A remote RF plasma chemical vapor deposition system for the deposition of amorphous silicon compounds provides some research effort in this Laboratory. Faculty Contact: Dr. Ward J. Collis


If you have any questions, contact Dr. Ward J. Collis